The COPRA DN201-X-GM Round Plasma Source is a flange mounted round RF-ICP source and are typically used for substrates sizes of up to 4"size and designed for PECVD, E-Gun Assist, Sputter-Assist, Chemical Etching, cleaning/activation, PALD, DLC. The COPRA DN201-X-GM Round Plasma Sources can be powered with up to 1,2kW and represent the smallest COPRA DN source for industrial productions. In relation to their small footprint they are very attractive to be used in installations where small dimensions are needed. The variety of process applications in relation to their small footprint and make these type of sources attractive working horses. The results achieved by the COPRA DN201-X-GM Round Plasma Source are transferable on larger substrate dimensions by using another type of our COPRA plasma sources for larger substrate sizes. The COPRA DN201-X-GM Round Plasma Source is the ideal partner for R&D labs and small productions, as this source can be used for a variety of applications. The COPRA DN201-X-GM Round Plasma Source is available in both manual and remote controlled versions.