COPRA Ring Sources

The COPRA Ring Sources are especially developed for Large Area high rate PECVD Processes as SiN, SiO, TiO, Al2O3, DLC etc. The COPRA Ring Sources are easy to install and stable running Plasma PECVD Sources. Since more than 10 years several different RS-Source types are running successfully in industrial production.

For static PECVD Processes the RS-Sources are suitable for substrate sizes up to Generation 4.5 and in dynamic processes they are still running for substrate widths of more than 3 meter.

The patented COPRA Matchbox is anytime an integrated part of the Source itself. Due to the special Source design and the existing experience of CCR for more than 20 years as an independent Plasma Source Manufacturer it is possible to customize every existing source to the special requests of the customer i.e. Process, Substrate and Chamber size.

furthermore it is possible to test the large area RS-Sources in House in our facility where 2 of them are running in our PECVD Lab since several years.

 

Main Applications

COPRA RS1000x300-DPR
1000x300 mm
neutral Plasma Beam (no filament)
Integrated Remote Match
-
900 mm
CCR Flange
13,56 MHz
6 or 10 kW
-
5x10-4 to 1x10-1 mbar
7/16 or LC
Profibus/Serial
2x flex tube 6 or 8 mm
>3,5 L/min
Swagelok 6 or VCR 1/4
AL
250 kg

The COPRA Ring Sources are especially developed for Large Area high rate PECVD Processes as SiN, SiO, TiO, Al2O3, DLC etc. The COPRA Ring Sources are easy to install and stable running Plasma PECVD Sources. Since more than 10 years several different RS-Source types are running successfully in industrial production.

For static PECVD Processes the RS-Sources are suitable for substrate sizes up to Generation 4.5 and in dynamic processes they are still running for substrate widths of more than 3 meter.

The patented COPRA Matchbox is anytime an integrated part of the Source itself. Due to the special Source design and the existing experience of CCR for more than 20 years as an independent Plasma Source Manufacturer it is possible to customize every existing source to the special requests of the customer i.e. Process, Substrate and Chamber size.

furthermore it is possible to test the large area RS-Sources in House in our facility where 2 of them are running in our PECVD Lab since several years.

 

Main Applications

COPRA RS1000x400-DPR
1000x400 mm
neutral Plasma Beam (no filament)
Integrated Remote Match
-
900 mm
CCR Flange
13,56 MHz
6 or 10 kW
-
5x10-4 to 1x10-1 mbar
7/16 or LC
Profibus/Serial
2x flex tube 6 or 8 mm
>3,5 L/min
Swagelok 6 mm or VCR 1/4
AL
255 kg

The COPRA Ring Sources are especially developed for Large Area high rate PECVD Processes as SiN, SiO, TiO, Al2O3, DLC etc. The COPRA Ring Sources are easy to install and stable running Plasma PECVD Sources. Since more than 10 years several different RS-Source types are running successfully in industrial production.

For static PECVD Processes the RS-Sources are suitable for substrate sizes up to Generation 4.5 and in dynamic processes they are still running for substrate widths of more than 3 meter.

The patented COPRA Matchbox is anytime an integrated part of the Source itself. Due to the special Source design and the existing experience of CCR for more than 20 years as an independent Plasma Source Manufacturer it is possible to customize every existing source to the special requests of the customer i.e. Process, Substrate and Chamber size.

furthermore it is possible to test the large area RS-Sources in House in our facility where 2 of them are running in our PECVD Lab since several years.

 

Main Applications

COPRA RS1150x300-DPR
1150x300 mm
neutral Plasma Beam (no filament)
Integrated Remote Match
-
1000 mm
CCR Flange
13,56 MHz
6 or 10 kW
-
5x10-4 to 1x10-1 mbar
7/16 or LC
Profibus/Serial
2x flex tube 6 or 8 mm
>3,5 L/min
Swagelok 6 mm or VCR 1/4
AL
255 kg

The COPRA Ring Sources are especially developed for Large Area high rate PECVD Processes as SiN, SiO, TiO, Al2O3, DLC etc. The COPRA Ring Sources are easy to install and stable running Plasma PECVD Sources. Since more than 10 years several different RS-Source types are running successfully in industrial production.

For static PECVD Processes the RS-Sources are suitable for substrate sizes up to Generation 4.5 and in dynamic processes they are still running for substrate widths of more than 3 meter.

The patented COPRA Matchbox is anytime an integrated part of the Source itself. Due to the special Source design and the existing experience of CCR for more than 20 years as an independent Plasma Source Manufacturer it is possible to customize every existing source to the special requests of the customer i.e. Process, Substrate and Chamber size.

furthermore it is possible to test the large area RS-Sources in House in our facility where 2 of them are running in our PECVD Lab since several years.

 

Main Applications

COPRA RS700x600-DPR
700x600 mm
neutral Plasma Beam (no filament)
Integrated Remote Match
550x450 mm
-
CCR Flange
13,56 MHz
6 or 10 kW
-
5x10-4 to 1x10-1 mbar
7/16 or LC
Profibus/Serial
2x flex tube 6 or 8 mm
>3,5 L/min
Swagelok 6 mm or VCR 1/4
AL
240 kg

The COPRA Ring Sources are especially developed for Large Area high rate PECVD Processes as SiN, SiO, TiO, Al2O3, DLC etc. The COPRA Ring Sources are easy to install and stable running Plasma PECVD Sources. Since more than 10 years several different RS-Source types are running successfully in industrial production.

For static PECVD Processes the RS-Sources are suitable for substrate sizes up to Generation 4.5 and in dynamic processes they are still running for substrate widths of more than 3 meter.

The patented COPRA Matchbox is anytime an integrated part of the Source itself. Due to the special Source design and the existing experience of CCR for more than 20 years as an independent Plasma Source Manufacturer it is possible to customize every existing source to the special requests of the customer i.e. Process, Substrate and Chamber size.

furthermore it is possible to test the large area RS-Sources in House in our facility where 2 of them are running in our PECVD Lab since several years.

 

Main Applications

COPRA RS 850x850-DPR
850x850 mm
neutral Plasma Beam (no filament)
Integrated Remote Match
700 x 700 mm
-
CCR Flange
13,56 MHz
6, 10 or 15 kW
-
5x10-4 to 1x10-1 mbar
7/16 or LC
Profibus/Serial
2x flex tube 6 or 8 mm
>3,5 L/min
Swagelok 6mm or VCR 1/4
AL
260 kg

The COPRA Ring Sources are especially developed for Large Area high rate PECVD Processes as SiN, SiO, TiO, Al2O3, DLC etc. The COPRA Ring Sources are easy to install and stable running Plasma PECVD Sources. Since more than 10 years several different RS-Source types are running successfully in industrial production.

For static PECVD Processes the RS-Sources are suitable for substrate sizes up to Generation 4.5 and in dynamic processes they are still running for substrate widths of more than 3 meter.

The patented COPRA Matchbox is anytime an integrated part of the Source itself. Due to the special Source design and the existing experience of CCR for more than 20 years as an independent Plasma Source Manufacturer it is possible to customize every existing source to the special requests of the customer i.e. Process, Substrate and Chamber size.

furthermore it is possible to test the large area RS-Sources in House in our facility where 2 of them are running in our PECVD Lab since several years.

 

Main Applications

COPRA RS400-DPR
Ø 400 mm
neutral Plasma Beam (no filament)
Integrated Remote Match
Ø 300 mm (12"Wafer)
-
CCR Flange
13,56 MHz
5 kW
-
5x10-4 to 1x10-1 mbar
7/16 or LC
Profibus/Serial
2x flex tube 6 or 8 mm
>3,5 L/min
Swagelok 6 mm or VCR 1/4
AL
160 kg

The COPRA Ring Sources are especially developed for Large Area high rate PECVD Processes as SiN, SiO, TiO, Al2O3, DLC etc. The COPRA Ring Sources are easy to install and stable running Plasma PECVD Sources. Since more than 10 years several different RS-Source types are running successfully in industrial production.

For static PECVD Processes the RS-Sources are suitable for substrate sizes up to Generation 4.5 and in dynamic processes they are still running for substrate widths of more than 3 meter.

The patented COPRA Matchbox is anytime an integrated part of the Source itself. Due to the special Source design and the existing experience of CCR for more than 20 years as an independent Plasma Source Manufacturer it is possible to customize every existing source to the special requests of the customer i.e. Process, Substrate and Chamber size.

furthermore it is possible to test the large area RS-Sources in House in our facility where 2 of them are running in our PECVD Lab since several years.

 

Main Applications

COPRA RS 500x500
500x500 mm
neutral Plasma Beam (no filament)
Integrated Remote Match
400x400 mm
-
CCR Flange
13,56 MHz
5 kW
-
5x10-4 to 1x10-1 mbar
7/16 or LC
Profibus/Serial
2x flex tube 6 or 8 mm
>3,5 L/min
Swagelok 6 mm or VCR 1/4
AL
200 kg

CCR is continously evolving, pioneering new approaches or reinventing existing ones stretching ourselves to better in everything we do. More than 20 years in the customization of RF-plasma sources are important values to be considered in order to find the best possible solution. Should you have a specific need for a customized solution please do not hesitate to contact us. We can customize any of our products and look forward to become your valuable supplier.