A highly efficient deposition method where the plasma
is cracking the molecules and chemical reactions occur to form the layer

Highest throughput performances  of excellent quality films coupled with maintenance poor operation and lowest energy footprints  are  so we believe the key factors for the future PECVD applications.

CCR´s proprietary COPRA PECVD plasma sources are  RF-ICP coupled high plasma density sources  enabling great control over the directionality of the ions also at lower pressure ranges for  a wide range of PECVD applications. The COPRA Plasma Sources for PECVD markets and applications are
scalable for large area applications and due to their high compatibility with corrosive gases suitable for countless applications. The COPRA RF-ICP  technology  represents an industrial proven quasi neutral
beam RF-ICP plasma source solution with process efficiencies which will make you want to plan your industrial  thin film coating needs with our  PECVD technique.

The COPRA PECVD  technology is  already changing and contributing to change the game  in industrial  PECVD applications.