CCR Technology GmbH

COPRA Plasma Sources
The unique feature of the COPRA Plasma Source Technology is the high degree of plasma excitation efficiency in combination with scalability from R&D to any kind of industrial production scale. Process engineers know the crux of the necessity to redesign the hardware in plasma processing whilst moving to a next step of industrial scales. The COPRA Technology breaks through this wall because the basic plasma parameter controlling a process result are not changing by scaling in size and speed as long as the right power level is adjusted. The COPRA Technology is therefore seen as a coming bench mark of industrial plasma standards.

All COPRA sources are inductively coupled low pressure rf plasma sources.
The overall technical specs depending on source type are:

DN 160/ 200

DN 250CF

DN250-ISOK

DN400/500

RF-Power	0.1 to 10kW
RF-Matching	Integrated ICP - Matchbox
Match Control	Remote or Manual
Pressure Range	5E-5 to 1mbar
Gases	Any
Cooling	Water
Substrate Dimension	up to 1300 mm

For Specifics Specs please click on the particular COPRA!

LS5

LS9

RS6

RS9/10/11

RS400

IS300

COPRA Cube

Faraday Cup

Table of Specification

COPRA Overview