Physical Etching - Ion Milling
| Rates for 200eV at 1mA/cm2 |  |
 |
|
| Ag | 90 nm/min | ||
| Au | 68 nm/min | ||
| Cr | 29 nm/min | ||
| Cu | 40 nm/min | ||
| Fe | 20 nm/min | ||
| Si | 87 nm/min | ||
| SiO2 | 26 nm/min | ||
Chemical Etching
- coming soon -
|
CCR TECHNOLOGY |
Camp Spich Strasse 3a, D-53842 Troisdorf, Germany +49 2241 932150, contact@ccrtechnology.de |
Physical Etching - Ion Milling