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COPRA DN250 CF
The COPRA DN 250CF is the working horse of the COPRA plasma sources because it fills up the gap between R&D and small scale industrial production. The COPRA DN250 CF is designated for 100 mm wafer processing but can also be applied as assist source for large area PVD as well as PECVD processes. The COPRA DN250CF as well as the DN160CF and DN200CF are designed for Ultra High Vacuum "UHV" application guaranteeing the highest degree of process purity.
   
DN250
 DN250drw
Substrate Size up to 4 inch
Pressure Range 1E-4 to 1mbar
Gases any
Rf-Power max. 1800 Watt
Matching Manual or Remote
Ion Energy up to 120eV
Current Density up to 2mA/ cm2
Extraction Grounded W-Grid
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