COPRA 160-200
The COPRA DN160CF and DN200CF are the low power members of the "COPRA Family" and are especially designated for R&D application. All process results achieved by the Copra 160 and COPRA 200 can later be transferred to large area COPRA sources to intent industrial production. Beside R&D there are also industrial applications where the COPRA DN160 and DN200 can be applied such as Atomic Layer Deposition "ALD" and PVD plasma assist.
| Substrate Size | up 3 inch |  |
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Dimension | DN160CF | DN200CF |
| Pressure Range | 1E-4 to 1mbar | A [mm] | 148 | 196 | ||
| Gases | any | B [mm] | 80 | 103 | ||
| RF-Power | max. 600 Watt | C [mm] | 280 | 333 | ||
| Matching | manual | D [mm] | 178 | 206 | ||
| Ion Energy | up to 200 eV | E [mm] | 166 | 192 | ||
| Current Density | up to 0.5 mA/cm2 | DN | 160CF | 200CF | ||
| Extraction | grounded W-Grid | Extraction | 84 mm | 122 mm | ||
| Apps | R&D ALD Assist |